The Nano-Tec gold coated silicon wafers are useful for thin film research, AFM / SPM, nanotechnology and biotechnology applications. The silicon wafers are coated with 50nm of pure gold over a 5nm adhesion layer of Cr. Both Cr and Au are deposited in a dedicated high vacuum deposition system with electron beam evaporation sources. The gold coating is not atomically flat; there are height differences in the nm range. The maximum use temperature is around 175°C; higher temperatures could result in delamination of the gold film. Available in two sizes: Ø2”/51mm and Ø4”/100mm. The Nano-Tec gold coated wafers are individually packed in wafer carrier trays for protection.
|Nano-Tec gold coated silicon wafer, Ø2inch/51mm, 275µm thickness, 50nm Au|
|Nano-Tec gold coated silicon wafer, Ø4inch/100mm, 525µm thickness, 50nm Au|