Desktop Pro allows for co-sputtering and deposition of magnetic and/or dielectric materials.
The perfect instrument for sample preparation when there is small space in the lab, the Desktop Pro sputtering system, compact and high vacuum, offers a superior productivity while occupying less than 914mm.
Sputtering platform designed for the preparation of samples in high vacuum.
It can reach low vacuum (10-6 torr) in less than 30 minutes, and it supports one or two cathodes in a confocal configuration, in order to grant a detailed film uniformity over a 4″ diameter area.
In this sputter power, gas flux, cathode and substrate thickness can be regulated in order to optimize the uniformity and deposition speed.
The options include co-sputtering and deposition of magnetic and/or dielectric materials.
For reactive sputtering, a programmable mass flux controller is available for a precise process control through a color touch screen.
The Desktop Pro is a professional instrument for the sample preparation.
The Desktop Pro PLC handles the system at every process step, from pumping to the deposition sequences, time, power and repeatability.
Safety switches grant a safe operation in every step, both in manual and automatic mode
It is recommended to use Desktop Pro when the following are needed:
- High research productivity with constant and repeatable results
- Quick format change in a multi-user environment
- Flexible process, including co-sputtering and the deposition of magnetic and/or dielectric materials
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